WaferSense by CyberOptics SemiconductorWaferSense by CyberOptics Semiconductor
August 2009
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In Memoriam


Dr. Steven CaseWe at CyberOptics are very saddened by the recent loss of our Founder and Chairman, Dr. Steve Case. Steve was a brilliant engineer, whose many inventions and technological breakthroughs not only established the foundation for CyberOptics' success, but also helped transform the surface mount electronics industry. More importantly, Steve was a wonderful friend and colleague to everyone who worked with him. Steve established a strong and capable management team, and we will do what he would want, and that is to continue aggressively pursuing the ideas and promising opportunities he helped set in motion.

- Kitty Iverson, President/CEO
CyberOptics Corporation

Trends in Wafer Processing Technology

Reports from the Fab

Fab Establishes PM Schedules, Improves Die Yield by Monitoring Equipment Vibration in Real-Time


The User: A 300 mm European fab for one of the world’s largest chipmakers.

Getting a Handle on Equipment Vibration

A 300 mm fab wanted to establish preventative maintenance (PM) schedules across its process areas, including front-end handling, vacuum chambers and vertical furnaces. They designed the PMs to detect and correct any equipment vibration that caused wafer defects and reduced die yield.

Process engineers across the fab employed multiple methods to troubleshoot possible links between wafer defects and equipment vibration in reaction to wafer scratches, breaks and particle contamination. Each method of measuring vibration was inefficient and implemented only after equipment vibration had led to wafer damage.

For instance, some techs at the fab used a stethoscope to listen to their equipment. Others placed an ear or hand on equipment to detect vibrations, according to Allyn Jackson, customer support manager at CyberOptics Semiconductor.
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Technically Speaking

Using WaferSense® Auto Teaching System (ATS) on 200 mm and 300 mm TEL CLEAN TRACK ACT and Mark Tools


Why Precision Calibration and Handoff Teaching is Critical on TEL CLEAN TRACK ACT and Mark Tools


1. Better resist uniformity

2. Recommended or required as part of routine PM’s

3. Required after robot, lift-pin, platen or other component replacements

4. Increased yield due to reduced particle generation with proper alignments and setups

5. Reduced scrap and wafer damage due to misalignments and mishandling

6. Required when system reports wafer placement errors

7. Necessary when troubleshooting unexplained problems such as excessive particles, unexpected tool noises, or unexplained abnormal
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